Pulse Ultrasonic Cure Monitoring of the Pultrusion Process
نویسندگان
چکیده
منابع مشابه
Ultrasonic Cure Monitoring of Photoresist During Pre-Exposure Bake Process
We have developed a sensor to measure the glass transition temperature (T,) of photoresist during its pre-exposure bake. During prebake, the resist must reach this temperature in order for significant solvent evaporation to occur. To determine T, we measured the change in phase of a high frequency pulse as it was reflected from the interface between an 8” silicon wafer and a photoresist film. T...
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ژورنال
عنوان ژورنال: Sensors
سال: 2018
ISSN: 1424-8220
DOI: 10.3390/s18103332